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- Sputtering Targets
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- Functional Crystals
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- Glass/Ceramic Substrates
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Metallic Targets
Materials | Purity | Size(Max) | Production Methods |
Al | 3~5N | 1000×300mm | Melting |
Ag | 4N | 1000×300mm | Melting |
Au | 4N | 800×300mm | Melting |
Bi | 4N | 400×200mm | Melting |
C石墨) | 3N | 600×300mm | Special Sintering |
Co | 3N | 800×300mm | Melting |
Cr | 2N5~3N5 | 500×200mm | Special Sintering |
Cu | 3N7 | 1000×300mm | Melting |
Fe | 2N5,3N,4N | 1000×300mm | Melting |
Ge | 4N | Dia 4″ | Special Sintering |
Hf | 3N | 500×200mm | Melting |
In | 4N | 800×300mm | Melting |
Mg | 3N5 | 500×300mm | Melting |
Mo | 3N5 | 500×300mm | Special Sintering |
Ni | 2N5,3N5,4N5 | 1000×300mm | Melting |
Pb | 3N,4N | 800×300mm | Melting |
Pd | 3N | 500×300mm | Melting |
Si | 5N | Dia 4″ | Special Sintering |
Sn | 3N5,5N | 1000×300mm | Melting |
Ta | 3N5 | 1000×300mm | Melting |
Ti | 2N5,3N | 1000×300mm | Melting |
V | 2N5,3N | 1000×300mm | Melting |
W | 3N5 | 1000×300mm | Melting |
Zn | 3N,4N | 800×300mm | Melting |
Zr | 3N | 800×300mm | Melting |
