InAs

With InAs single crystal substrate, InAsSb/In-AsPSb, InNAsSb and other heterojunction materials can be grown to produce infrared light-emitting devices with wavelengths of 2-14μm. InAs single crystal substrates can also be used to epitaxially grow AlGaSb superlattice structure materials. Mid-infrared quantum cascade laser. These infrared devices have good application prospects in gas monitoring, low-loss optical fiber communications and other fields. In addition, InAs single crystal has high electron mobility and is an ideal material for making Hall devices. As a single crystal substrate, InAs materials need to have low dislocation density, good lattice integrity, appropriate electrical parameters and high uniformity. The main growth method of InP single crystal materials is the traditional liquid-sealed Czochralski technology (LEC).

CasCrysTech (CCT) provides high quality Indium Arsenide (InAs) crystas which can be customized upon customer's requirements.


Uses/Applications

With InAs single crystal substrate, InAsSb/In-AsPSb, InNAsSb and other heterojunction materials can be grown to produce infrared light-emitting devices with wavelengths of 2-14μm.
InAs single crystal substrates can also be used to epitaxially grow AlGaSb superlattice structure materials and mid-infrared quantum cascade laser.
The infrared devices have good application prospects in gas monitoring, low-loss optical fiber communications and other fields.

Features/Benefits

InAs single crystal has high electron mobility.

  • Parameters

    Single Crystal

    Dopant

    Conduction Type

    Carrier Concentration

    (cm-3)

    Mobility (cm2/V.s)

    Dislocation Density (cm-2)

    Standard Substrate

    InAs

    Undoped

    N

    5´1016

    ³2´104

    <5´104

    Φ2″×0.5mm

    Φ3″×0.5mm

    InAs

    Sn

    N

    (5-20) ´1017

    >2000

    <5´104

    Φ2″×0.5mm

    Φ3″×0.5mm

    InAs

    Zn

    P

    (1-20) ´1017

    100-300

    <5´104

    Φ2″×0.5mm

    Φ3″×0.5mm

    InAs

    S

    N

    (1-10)´1017

    >2000

    <5´104

    Φ2″×0.5mm

    Φ3″×0.5mm

    Dimension

    Dia50.8x0.5mm,10×10×0.5mm10×5×0.5mm

    According to customer needs, substrates with special orientation and size can be customized.

    Surface Roughness

    Surface roughness(Ra):<=5 Å
    Atomic particle microscope ( AFM ) test report can be provided

    Polishing

    One side or two sides

    Package

    Class 100 clean bag, Class 1000 super clean room


  • Dimension

    Φ50.8x0.5mm,10×10×0.5mm、10×5×0.5mm


    Orientation and size can be customized.