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- Coated Wafers
- Pt/Ti/SiO2/Si
- Functional Crystals
- Crystal Substrates
- Sputtering Targets
- Powder, Sputtering Sources
- Metal Crystals
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- Glass/Ceramic Substrates
- Mat. Processing, Equipment Service
Pt/Ti/SiO2/Si
Specializes in providing Pt / Ti / SiO2 / Si wafer.
Specific specifications
Pt Layer : 150 nm
Ti Layer : 20 nm
SiO2 Layer: 300 nm
Specification of base silicon wafer
Si Wafer
Type/Dopant: P/BS
Orientation:<100>+/-0.5degree
Size: dia4” x 0.5 mm
Surface: one side polished
Resistivity: Not Available
